Tetramethylammonium Hydroxide (TMAH)

Tetramethylammonium Hydroxide (TMAH) is a quaternary ammonium compound with CAS Number 75-59-2.  As a metal-ion-free alkaline agent, TMAH serves as an effective replacement for inorganic bases like KOH or NaOH in processes requiring ultra-high purity.

Tetramethylammonium Hydroxide (TMAH), a powerful organic base widely used in semiconductor manufacturing, photolithography, etching, and cleaning processes.

Technical Specifications

Packaging & Storage

• Net weight 200kg drum or 1000kg IBC drum.

• Store in tightly sealed container, protect from light.

Key Benefits of Tetramethylammonium Hydroxide (TMAH)

Metal-Ion-Free:

Prevents ionic contamination in sensitive semiconductor wafers and devices.

Strong Alkaline Properties:

Excellent for anisotropic etching of silicon and developing acidic photoresists.

High Selectivity:

Provides controlled etching rates with minimal undercutting in microfabrication.

Versatile Formulations:

Compatible with various concentrations and solvents for custom developer, etchant, or cleaner solutions.

Effective Cleaning and Stripping:

Removes photoresist residues efficiently while maintaining surface integrity.

Primary Applications Tetramethylammonium Hydroxide (TMAH)

TMAH is essential in modern semiconductor production and beyond:

Semiconductor and Electronics Industry

• Photoresist Developer: Standard in photolithography concentration to dissolve exposed photoresist.

• Anisotropic Silicon Etchant: Used for precise silicon wafer patterning in MEMS and integrated circuits.

• Photoresist Stripper and Post-Etch Cleaner: Removes residues without metal contamination.

• Flat Panel Displays, PCBs, and Sensors: Critical for manufacturing LCD/OLED panels and printed circuit boards.

Other Industrial Uses

• Phase transfer catalyst in organic synthesis.

• Surfactant in ferrofluid production and nanoparticle stabilization.

• Formulation component in polymers, electrolytes, zeolites, and energy storage applications.

• Thermochemolysis and DNA microarray cleaning in research settings.

Frequently Asked Questions (FAQs)

Q: Is TMAH safe for use?

A: No. TMAH is highly corrosive and acutely toxic.  It must be handled with extreme caution using full personal protective equipment and proper engineering controls.  Any skin exposure requires immediate medical attention.

Q: Why is TMAH preferred over KOH or NaOH in semiconductors?

A: TMAH is metal-ion-free, preventing contamination of wafers and devices while providing excellent etching and developing performance.

Q: What are the main hazards of TMAH?

A: It causes severe chemical burns to skin and eyes and can lead to systemic toxicity through skin absorption.  It is also harmful to the environment.

Q: How should TMAH be stored?

A: Store in tightly sealed containers in a cool, dry, well-ventilated area away from acids, oxidizers, and air.

Q: Can TMAH be used in food or pharmaceutical applications?

A: No.  TMAH is intended for industrial, laboratory, and electronics use only and is not suitable for food, drug, or cosmetic applications.

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